Coding

Part:BBa_K1499200:Experience

Designed by: Raman Nelakanti   Group: iGEM14_StanfordBrownSpelman   (2014-08-22)

Radiation Assay
Liquid cultures of NEB5α transformed with uvsE (with promoter+RBS) and the control (promoter+RBS only) in pSB1A2 were grown overnight at 37°C. The following day, the cells were washed and resuspended in 0.9% NaCl solution. Cell concentration was then adjusted to 10^7/mL in 5mL of a glass Petri dish. Each sample was then exposed to 0.5 J/(m^2*sec) of UV-C radiation from a UV lamp for a cumulative of 0, 6, 12, 18, 24, and 30 seconds. After each exposure, a dilution spot assay was conducted to determine the number of surviving cells.

Results
The part works as expected and imparts significant UV radiation resistance to E. coli.

UvsE confers significant radiation resistance to DH5-alpha cells after exposure to UVC. Data were determined to be significant to p<.05 and p<.01 using a two-tailed Student's t-test.

Applications of BBa_K1499200

With this radiation resistance gene, one can produce cells that can withstand stresses for uses in harsh, high radiation environments, like high elevation or in space.

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